High repetition rate microsecond pulse generation for material processing using a planar waveguide CO/sub 2/ MOPA system

Abstract

Summary form only given. Using pulse widths between 1 and 20 /spl mu/s and materials which are strongly absorbing at the 10.6 /spl mu/m wavelength, the penetration depth of heating can be minimised whilst avoiding the severe plasma screening effects associated with sub-microsecond irradiation. We present development of the RF excited planar waveguide technology to produce sealed-off, static gas sources for this intermediate processing window. We have developed a 7-pass CO/sub 2/ planar waveguide amplifier system aimed at providing high peak power, short duration laser pulses of good beam quality.