Statistical model of processing the results of technological control at testing enamel wire insulation by high voltage during the production process

Oksana Holyk, L. Shchebeniuk, Oleksandr Kiessaiev, Yuliia Gontar, Mykola Zykov, A. Shurupova, R. Belyanin, T. Antonets
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Abstract

The results of non-destructive technological control of the number of defects in the enamel wire insulation based on polyetherimide polymer are presented. The application of statistical analysis of the measurement results of control indicators with the help of a mathematical trend model for the use in active technological control is considered. Recommendations for the practical use of the trend function parameters to control the probability of finding several parameters within the established limits are proposed. The main parameter of the trend is the flow parameter of the number of defects exceeding the established technological limit (the failure flow parameter) in short periods of the technological time, for example, for each spool of wire (several thousand meters of wire). The ability to quantitatively assess the tendency of enamel insulation defects for the wire with two-layer insulation with a nominal diameter of 0.63 mm during a continuous technological cycle has been theoretically explained and confirmed by measurements. Quantitative assessment of the tendency of changing the enamel insulation defectiveness allows using a model based on collating the information on a significant number of control parameters. At the same time, one parameter of the spectrum of interrelated ones is allowed to exceed a set technological limit, which ensures sensitivity to changes in this limit. Data on the sensitivity of this model to technological changes are presented
漆包线生产过程中高压绝缘试验工艺控制处理结果的统计模型
介绍了对聚醚酰亚胺基漆包线绝缘缺陷数进行无损工艺控制的结果。研究了利用数学趋势模型对控制指标测量结果进行统计分析的方法在主动工艺控制中的应用。对实际使用趋势函数参数来控制在既定范围内找到几个参数的概率提出了建议。趋势的主要参数是在短工艺时间内缺陷数量超过既定工艺极限的流量参数(失效流量参数),例如每卷线材(数千米线材)。对公称直径为0.63 mm的两层绝缘线在连续工艺周期内的搪瓷绝缘缺陷趋势进行定量评估的能力,从理论上得到了解释,并通过测量得到了证实。对釉质绝缘缺陷变化趋势的定量评估允许使用基于对大量控制参数信息进行整理的模型。同时,相关光谱的一个参数允许超过设定的技术限制,以确保对该限制变化的敏感性。给出了该模型对技术变化敏感性的数据
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