Hartmann screen test for measurement of stress during thin film deposition

ACOFT/AOS 2006 - Australian Conference on Optical Fibre Technology/Australian Optical Society Pub Date : 2006-07-10 DOI:10.1109/ACOFT.2006.4519323

P. Wilksch, F. Forouzandeh

引用次数: 0

Abstract

The Hartmann screen test for measuring changes in curvature of a surface has been adapted to create a system for continuous in situ monitoring of the internal stress in thin films during plasma deposition.

查看原文本刊更多论文

在薄膜沉积过程中测量应力的哈特曼筛选试验

用于测量表面曲率变化的哈特曼筛选测试已被用于创建一个系统，用于在等离子沉积过程中对薄膜中的内应力进行连续的原位监测。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

ACOFT/AOS 2006 - Australian Conference on Optical Fibre Technology/Australian Optical Society

自引率

0.00%

发文量