Ion beam figuring with using Einzel lens

Abstract

Ion Beam Figuring (IBF) has been used for nearly 20 years by several laboratories and companies as a highly deterministic method of final processing of ultra-precision optical elements. Nowadays, requirements for high precision optics demand to have full control over the ion beam, which includes both the ion beam profile and intensity. Electrostatic focusing using an Einzel lens setup provides a simple option to control the ion beam shape by changing voltage. This experimental study investigates the early stage development of an Einzel lens used to control an RF40 ion source. First results demonstrate the possibility to use an Einzel lens to control the ion beam profile and indicate possible future challenges this technology has to overcome when used in IBF machines.