Simulation of a Plasma Enhanced µ-jet-CVD Process

Abstract

We present results of a coupled calculation to simulate the combined movement and plasma excitation of a process gas, accelerated in the form of a fine beam, known as micro-jet (µ-jet-CVD), between the RF electrodes of a CVD-plasma-reactor, before it reaches the deposition surface. The form and geometry of the deposition, as well as its chemical and physical properties, depend on the chemical properties of the gas, the externally supplied electrical energy as well as the gas-dynamical characteristics of the flow [1]. Previous open jet numerical simulations have examined the possibility of an existing direct analogy of the deposition form to the form of jet lines-geometry for corresponding pressure values in the reactor device. The present preliminary study shows the feasibility of flow coupled to plasma-excitation simulation calculations. The process simulated here is most probably well away from the equilibrium state.