Halogen Doped Electronic Properties of 2D ZnO: A First Principles Study

Hossain Mansur Resalat Faruque, Kamal Hosen, A. S. M. Jannatul Islam, M. S. Islam
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引用次数: 1

Abstract

In recent times, two dimensional (2D) ZnO has attracted a great attention in the field of nano-research due to its extraordinary electronic, thermal and optical properties. In this paper, we have explored the effects of halogen impurity doping such as F, Cl, and Br atoms on the electronic properties of 2D ZnO using first principles calculation. The pristine 2D ZnO exhibits a semiconducting behavior with a direct bandgap of 1.67 eV on the Γ point. However, when impurities such as F, Cl, or Br atoms are introduced, the 2D ZnO shows semi-metallic behavior with almost zero bandgap. It is perceived that, owing to the introduction of F impurity, the zero bandgap is exhibited at the K point of the electronic band structure. However, in the case of Cl and Br impurities, the nearly zero bandgap is observed elsewhere rather than on the K point. Moreover, due to the introduction of impurity atoms, the Fermi level also shifted towards the conduction band (CB) suggesting an increase of the carrier concentration in the density of states (DOS) results. These findings might be very much beneficial when doping effect, especially halogen impurity doping is considered to modulate the electronic properties of 2D ZnO in the near future.
卤素掺杂二维ZnO的电子性质:第一性原理研究
近年来,二维氧化锌以其优异的电子、热学和光学性能在纳米研究领域受到了广泛的关注。在本文中,我们利用第一性原理计算探讨了卤素杂质掺杂如F、Cl和Br原子对二维ZnO电子性质的影响。原始的二维ZnO表现出半导体行为,在Γ点上的直接带隙为1.67 eV。然而,当引入F、Cl或Br原子等杂质时,二维ZnO表现出几乎为零带隙的半金属行为。可以看出,由于F杂质的引入,在电子能带结构的K点处出现了零带隙。然而,在Cl和Br杂质的情况下,在其他地方而不是在K点上观察到接近零的带隙。此外,由于杂质原子的引入,费米能级也向传导带(CB)偏移,这表明在态密度(DOS)结果中载流子浓度增加。这些研究结果对研究掺杂效应,特别是卤素杂质掺杂对二维ZnO电子性能的影响具有重要意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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