Richard M. De La Rue, B. Lahiri, A. Samarelli, D. Logan, A. Khokhar, R. Dylewicz, P. Velha, D. Macintyre, N. Johnson, F. Rahman, M. Sorel
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引用次数: 2
Abstract
Device structures in high refractive index materials, notably semiconductors such as silicon, will form the basis for high-density integrated photonics. Nanometre-scale structuring - in conjunction with photonic crystal, photonic wire and plasmonic/metamaterial principles - will be required in order to realise the full potential for a variety of applications.