High Performance MEMS IMU with ThELMA-Double Technology

G. Gattere, F. Rizzini, L. Guerinoni, L. Falorni, C. Valzasina, F. Vercesi, L. Corso, G. Allegato
{"title":"High Performance MEMS IMU with ThELMA-Double Technology","authors":"G. Gattere, F. Rizzini, L. Guerinoni, L. Falorni, C. Valzasina, F. Vercesi, L. Corso, G. Allegato","doi":"10.1109/INERTIAL53425.2022.9787756","DOIUrl":null,"url":null,"abstract":"This paper presents the design, architecture, and characterization of STMicroelectronics first prototype 6-axis Inertial Measurement Unit (IMU) manufactured with a novel micromachining technology. The platform novelty consists in the fabrication of structural and electrical elements using multiple independent thick epitaxial polysilicon layers. The performance of the device with respect to standard technology is deeply analyzed through the state-of-art characterization steps of STMicroelectronics IMU production. The improvements in terms of electrical figures, parametric stability and mechanical robustness are presented.","PeriodicalId":435781,"journal":{"name":"2022 IEEE International Symposium on Inertial Sensors and Systems (INERTIAL)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE International Symposium on Inertial Sensors and Systems (INERTIAL)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INERTIAL53425.2022.9787756","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

This paper presents the design, architecture, and characterization of STMicroelectronics first prototype 6-axis Inertial Measurement Unit (IMU) manufactured with a novel micromachining technology. The platform novelty consists in the fabrication of structural and electrical elements using multiple independent thick epitaxial polysilicon layers. The performance of the device with respect to standard technology is deeply analyzed through the state-of-art characterization steps of STMicroelectronics IMU production. The improvements in terms of electrical figures, parametric stability and mechanical robustness are presented.
采用ThELMA-Double技术的高性能MEMS IMU
介绍了意法半导体(STMicroelectronics)采用新型微加工技术制造的首个六轴惯性测量单元(IMU)原型机的设计、结构和特性。平台的新颖性在于使用多个独立的厚外延多晶硅层制造结构和电气元件。通过意法半导体IMU生产中最先进的表征步骤,深入分析了该器件在标准技术方面的性能。在电气性能、参数稳定性和机械鲁棒性方面进行了改进。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信