Parametric Pattern-Making Modeling Based on Constraint and Graph

Yi Xiu, Zhen-kai Wan, Wenlu Cao
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引用次数: 2

Abstract

Parametric pattern-making technology has based on procedural process for past decades in the field of GCAD. This paper presents a new method of parametric pattern-making technology. This method firstly finds out the constraint relations among geometric entities by analyzing the rules and sequences of geometric entities in pattern-making operation and confirms the local and whole well-constraint in pattern with geometric constraint principle, secondly represents the geometric constraints in pattern as a constraint graph and depicts the data structure of constraint graph with adjacent table, finally builds a parametric pattern-making model. The solving algorithm of the model implements the entity-edited and size-driven function. The experiments show the model is feasible and effective.
基于约束和图的参数化制版建模
在过去几十年的GCAD领域中,参数化制图技术是基于程序过程的。提出了一种新的参数化制模技术。该方法首先通过分析几何实体在图案制作过程中的规则和顺序,找出几何实体之间的约束关系,利用几何约束原理确定图案中的局部井约束和整体井约束,然后将图案中的几何约束表示为约束图,并用邻接表描述约束图的数据结构,最后建立参数化的图案制作模型。模型求解算法实现了实体编辑和尺寸驱动功能。实验证明了该模型的可行性和有效性。
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