Kinetics of charge carrier recombination in beta-Ga2O3 single crystals (Conference Presentation)

C. Ton‐That, T. Huynh, L. L. Lem, A. Kuramata, M. Phillips
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Abstract

We used temperature-resolved cathodoluminescence to determine the characteristics of luminescence bands and carrier dynamics in edge-defined film-fed grown (EFG) beta-Ga2O3 single crystals synthesized by Tamura Corporation. The crystal is nominally undoped and has a (-201) surface orientation. The main impurities are Si, Ir, Al and Fe, with [Fe] ~ 10^17 cm-3 verified by Inductively Coupled Plasma Mass Spectrometry (ICP-MS). The CL emission was found to be dominated by a broad UV emission peaked at 3.40 eV, which exhibits strong quenching with increasing temperature; however, its spectral shape and energy position remain virtually unchanged up to 500 K. Depth-resolved analysis reveals the luminescence spectrum is independent of sampling depth. We observed a super-linear increase of CL intensity with excitation density; this kinetics of carrier recombination can be explained in terms of carrier trapping and charge transfer at Fe3+/2+ centers. The temperature-dependent properties of this UV band were found to be consistent with weakly bound electrons in self-trapped excitons with an activation energy of 48 +/- 10 meV. In addition to the self-trapped exciton emission, a blue luminescence (BL) band is shown to be related to a donor-like defect, which increases significantly in concentration after remote hydrogen plasma treatment. The point defect responsible for the BL, likely an oxygen vacancy or a complex, is strongly coupled to the lattice with a Huang-Rhys factor S = 7.3.
β - ga2o3单晶中载流子复合动力学(会议报告)
利用温度分辨阴极发光技术,研究了Tamura公司合成的边缘薄膜生长(EFG) β - ga2o3单晶的发光带特征和载流子动力学。晶体名义上未掺杂,表面取向为(-201)。主要杂质为Si、Ir、Al和Fe,经电感耦合等离子体质谱(ICP-MS)验证为[Fe] ~ 10^17 cm-3。CL的发射以宽紫外为主,峰值在3.40 eV处,随温度升高表现出强猝灭;然而,它的光谱形状和能量位置几乎保持不变,直到500k。深度分辨分析表明,发光光谱与采样深度无关。我们观察到CL强度随激发密度呈超线性增长;载流子复合的动力学可以用Fe3+/2+中心的载流子捕获和电荷转移来解释。发现该UV带的温度依赖性与自捕获激子中的弱束缚电子相一致,活化能为48 +/- 10 meV。除了自捕获激子发射外,蓝色发光(BL)带与供体样缺陷有关,该缺陷在远距离氢等离子体处理后浓度显著增加。造成BL的点缺陷,可能是氧空位或络合物,与晶格强耦合,黄里斯因子S = 7.3。
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