Physical Design and Verification for Embedded CPU under Deep Submicron Technology

Ran Fan, Zheng Dandan
{"title":"Physical Design and Verification for Embedded CPU under Deep Submicron Technology","authors":"Ran Fan, Zheng Dandan","doi":"10.1109/ICDMA.2013.217","DOIUrl":null,"url":null,"abstract":"To overcome the challenges brought by the scale down of feature size, a flow of physical design and verification for embedded CPU under deep submicron technology is put forward in this paper. New problems are encountered in timing closure, signal integrity, IR drop and antenna effect, so we must select the effective EDA tools and develop new flow of physical design and verification combining with the characteristics of circuit under deep submicron technology. New challenges are analyzed, especially the interconnect line effect, and how to prevent the crosstalk and ensure the timing performance has been discussed. The embedded CPU CK610 using 0.13um 1P4M CMOS process technology has been completed by this new flow and the result indicates this chip complies with all requirements.","PeriodicalId":403312,"journal":{"name":"2013 Fourth International Conference on Digital Manufacturing & Automation","volume":"83 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 Fourth International Conference on Digital Manufacturing & Automation","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICDMA.2013.217","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

To overcome the challenges brought by the scale down of feature size, a flow of physical design and verification for embedded CPU under deep submicron technology is put forward in this paper. New problems are encountered in timing closure, signal integrity, IR drop and antenna effect, so we must select the effective EDA tools and develop new flow of physical design and verification combining with the characteristics of circuit under deep submicron technology. New challenges are analyzed, especially the interconnect line effect, and how to prevent the crosstalk and ensure the timing performance has been discussed. The embedded CPU CK610 using 0.13um 1P4M CMOS process technology has been completed by this new flow and the result indicates this chip complies with all requirements.
深亚微米技术下嵌入式CPU的物理设计与验证
为了克服特征尺寸缩小带来的挑战,本文提出了一种深亚微米技术下嵌入式CPU的物理设计与验证流程。在时序闭合、信号完整性、红外下降和天线效应等方面遇到了新的问题,因此必须选择有效的EDA工具,结合深亚微米技术下电路的特点,开发新的物理设计和验证流程。分析了新的挑战,特别是互连线的影响,并讨论了如何防止串扰和保证定时性能。采用该流程完成了0.13um 1P4M CMOS工艺的嵌入式CPU CK610,结果表明该芯片符合所有要求。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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