Novel AMP surface treatment for improving optical fiber strength and laser gain (Conference Presentation)

D. VanBlarcom, D. Drachenberg, M. Monticelli, G. Davalos, S. Davis, N. Schenkel, M. Cook, R. Crist, M. Messerly, J. Dawson
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引用次数: 1

Abstract

Contaminants can severely limit the efficiency, laser damage threshold, and strength of photonic crystal fiber-based lasers. Such contamination can occur due to environmental exposure during the pulling or stacking of rods and tubes or improper handling and storage of these glass components. A preform made by the “stack and draw” process is susceptible to incorporating surface contaminants into the bulk laser glass. We have adapted cleaning and handling protocols originally developed for processing large fused silica optics for the National Ignition Facility. The etch cleaning process reported here mimics the “AMP” or “Advanced Mitigation Process” developed for NIF optics that see high fluence 351nm light. In addition, all cleaning, fixturing and assembly processes used to prep a stack for pulling into a fiber are done in a Class 100 cleanroom. Glass rods (1-3mm in diameter and 10” long) are assembled into a Teflon fixture that only contacts the rods at each end. The loaded fixture receives 120kHz ultrasonic cleaning in 10% sodium hydroxide at 45C and 3% Brulin 1696 detergent at 55C. Parts are thoroughly rinsed using ultrasonicated ultrapure water and spray rinses. A 200nm etch in buffered hydrofluoric acid (6:1 BOE diluted 2:1 in DI water) is followed by additional ultasonicated (120kHz-270kHz) ultrapure water and spray rinse. Finally, the components are allowed to fully dry inside the Teflon frame. The rods are cleaned, stacked, and assembled into a fused silica tube. The preform stack is then returned to a non-cleanroom area to be pulled into fiber using standard telecom fiber-based draw tower equipment and without clean air filters around the draw area. Four fibers were made to test independently the damage threshold and the background loss, two Yb core active fibers and two silica core (F clad) fibers. One of each was cleaned with the AMP process, and one of each with a methanol wipe cleaning process. The active fiber was coated with a dual acrylate coating, first with a low-index inner coating to provide a pump cladding, and then with a relatively hard coating to protect the relatively soft primary coating. The active fibers were pumped at 980nm in a double Fresnel cavity configuration and the power increased until the fiber was damaged up to 1kW. The passive fiber background loss was measured using a standard cut-back technique. Replacing the former methanol wipe clean process with this aqueous cleaning process improved the 1060nm damage threshold of a fiber laser by >30x to above the kW level in the laboratory and reduced the background attenuation by >18x. Early indications are that the acid etching also makes the tensile strength of the fiber consistently high. This work was performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344.
用于提高光纤强度和激光增益的新型 AMP 表面处理技术(会议演讲)
污染物会严重限制光子晶体光纤激光器的效率、激光损伤阈值和强度。在拉拔或堆叠棒材和管材的过程中,或在处理和储存这些玻璃组件不当的情况下,环境暴露会导致此类污染的发生。通过 "堆叠拉拔 "工艺制作的预型件很容易将表面污染物带入激光玻璃块体中。我们对最初为国家点火装置加工大型熔融石英光学元件而开发的清洁和处理规程进行了调整。这里报告的蚀刻清洁工艺模仿了为国家点火装置光学元件开发的 "AMP "或 "高级缓和工艺",这些光学元件可以看到高通量的 351nm 光。此外,所有用于将堆栈拉入光纤的清洁、固定和组装过程都是在 100 级洁净室中完成的。玻璃棒(直径 1-3 毫米,长 10 英寸)被装配到特氟隆夹具中,夹具只接触玻璃棒的两端。装入的夹具在 45 摄氏度的 10% 氢氧化钠和 55 摄氏度的 3% Brulin 1696 洗涤剂中接受 120kHz 超声波清洗。使用超声超纯水和喷雾冲洗彻底冲洗部件。在缓冲氢氟酸(6:1 BOE 以 2:1 的比例在去离子水中稀释)中蚀刻 200nm 后,再用超声(120kHz-270kHz)超纯水和喷雾冲洗。最后,让组件在特氟龙框架内完全干燥。然后将预制棒堆放在非洁净室区域,使用标准的电信光纤牵伸塔设备将其牵伸为纤维,牵伸区域周围不使用洁净空气过滤器。为了独立测试损伤阈值和本底损耗,我们制作了四根光纤,两根掺镱芯有源光纤和两根硅芯(F 包层)光纤。其中一根采用 AMP 工艺进行清洁,另一根采用甲醇擦拭清洁工艺进行清洁。有源光纤涂有双层丙烯酸酯涂层,首先是低指数内涂层,以提供泵浦包层,然后是相对较硬的涂层,以保护相对较软的主涂层。有源光纤在双菲涅尔腔配置中以 980nm 波长进行泵浦,功率不断增加,直至光纤损坏到 1kW。使用标准的回切技术测量了无源光纤的本底损耗。用这种水清洗工艺取代以前的甲醇擦拭清洗工艺后,光纤激光器的 1060nm 损坏阈值提高了 30 倍以上,达到了实验室中千瓦级以上的水平,背景衰减降低了 18 倍以上。早期迹象表明,酸蚀刻还能使光纤的抗拉强度始终保持在较高水平。这项工作是在美国能源部的支持下,由劳伦斯利弗莫尔国家实验室根据 DE-AC52-07NA27344 合同完成的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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