Characterization of tunnel oxides for non-volatile memory (NVM) applications

Abstract

The purpose of this paper is to characterize, to compare different types of tunnel oxides and to determine the impact on the MB (Moving Bit measurement) issues. The measurements and comparison carried out for the following tunnel oxide thickness in the range of 8 to 10 nm is used. They are: (1) Dry oxidation at 900 C which gives acceptable oxide quality in the thickness range of 100 /spl Aring/ (2) 5% O/sub 2/ diluted oxidation at 900 C, (3) 5% O/sub 2/ diluted oxidation at 960 C and (4) Wet oxidation at 750 C which gives superior results even for a minimal oxide thickness of 88.9 /spl Aring/.