Breakdown characteristics of 12–20 kV-class 4H-SiC PiN diodes with improved junction termination structures

H. Niwa, G. Feng, J. Suda, T. Kimoto
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引用次数: 29

Abstract

Ultrahigh-voltage 4H-SiC PiN diodes with improved junction termination extension (JTE) structures have been investigated. Breakdown characteristics of 4H-SiC PiN diodes with conventional single-zone JTE was shown to be severely affected by the charge near the SiO2/SiC interface from experiment and device simulation. Taking the effect of the interface charge into account, and by using “Space-Modulated” JTE structure with a wide optimum JTE-dose window to tolerate the impact of interface charge, we achieved a breakdown voltage of 21.7 kV (81 % of the ideal breakdown voltage calculated from the epilayer structure), which is the highest breakdown voltage among any semiconductor devices ever reported.
改进结端结构的12 - 20kv级4H-SiC PiN二极管击穿特性
研究了具有改进结端延伸(JTE)结构的超高压4H-SiC PiN二极管。实验和器件仿真结果表明,SiO2/SiC界面附近电荷对传统单区JTE的4H-SiC引脚二极管击穿特性有严重影响。考虑到界面电荷的影响,并通过使用具有宽最佳JTE剂量窗的“空间调制”JTE结构来承受界面电荷的影响,我们实现了21.7 kV的击穿电压(从epilayer结构计算的理想击穿电压的81%),这是迄今为止报道的半导体器件中最高的击穿电压。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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