Design and fabrication of CPW to dielectric image-guide transitions at 60 GHz on SOI

Abstract

In this paper, a novel millimeter-wave dielectric image-guide to CPW transition has been designed and fabricated using micromachining fabrication techniques. The new provided technology uses high resistivity SOI wafer to implement a low loss dielectric image guides at the millimeter-wave range of frequencies. The coplanar waveguide is patterned with Aluminum over the dielectric image-guide. The measurement results are in good agreement with the simulation results and show that the insertion loss of the transition is 0.82 dB at 60 GHz.