Effect of the metal nature on the I-V characteristics of CdTe diodes for ionizing radiation detectors

V. Sklyarchuk, V. Gnatyuk, T. Aoki
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Abstract

The electrical characteristics of CdTe-based surface barrier structures, which can be used as spectroscopic X/γ-ray detectors, have been investigated. The metal-semiconductor structures were obtained by thermal (resistive) vacuum deposition of various metals onto detector-grade CdTe crystals. Metals with different work functions, such as Al, In, Ni, Ti, Cr, and Au, were employed as electrode materials for rectifying contacts. An ohmic contact was created on the entire opposite surface of the crystals by chemical deposition of Au from a gold chloride solution. The surface processing of CdTe crystals before the formation of both rectifying and ohmic contacts included mechanical and chemical polishing, as well as Ar-ion bombardment. Dark currents at reverse voltage of 1500 V did not exceed 4 nA for all the diodes except for the Au/CdTe/Au structure. The effect of the metal nature on the I-V characteristics and charge carrier transport mechanisms was studied, and the features of voltage dependences of dark current were explained by differences in the work functions of the metals, as well as the contact deposition technique.
金属性质对电离辐射探测器用CdTe二极管I-V特性的影响
本文研究了可作为X/γ射线光谱探测器的cdte基表面势垒结构的电学特性。通过热(阻)真空沉积各种金属在探测器级CdTe晶体上获得金属半导体结构。具有不同功函数的金属,如Al、In、Ni、Ti、Cr和Au,被用作整流触点的电极材料。从氯化金溶液中化学沉积金,在晶体的整个相反表面产生欧姆接触。在形成整流触点和欧姆触点之前,CdTe晶体的表面处理包括机械抛光和化学抛光,以及ar离子轰击。除Au/CdTe/Au结构外,所有二极管在1500 V反向电压下的暗电流均不超过4 nA。研究了金属性质对金属的I-V特性和载流子输运机制的影响,并通过金属的功函数差异和接触沉积技术解释了暗电流的电压依赖性特征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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