A Novel 600V Lateral RESURF 4H-SiC MESFET with Sloped Field Plate for High Power and High Frequency Applications

Atsushi Shimbori, A. Huang
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引用次数: 2

Abstract

Silicon carbide $(SiC)$ possesses a high breakdown field of $4\times 10^{6}V/cm$, high saturated electron drift velocity of $2\times 10^{7}cm/s$ and excellent thermal conductivity of 4.9 $W/cm\cdot K$ attributing from its wide bandgap. These characteristics make this material attractive for incorporating new approaches in device design such as the RESURF (Reduced Surface Field) technology, which is an innovative method for designing lateral high-voltage, low on-resistance devices. We have demonstrated a 600V Lateral RESURF 4H-SiC MESFET with sloped passivation which shows significantly higher power density as opposed to conventional RF GaAs devices and silicon LDMOS transistors. A sloped field plate structure is utilized to drain, source, and gate electrodes to reduce the surface electric field and significantly improve breakdown voltage up to 560V without sacrificing forward on-resistance.
一种适用于大功率高频应用的新型600V横向RESURF倾斜场极板4H-SiC MESFET
碳化硅(SiC)具有4\ × 10^{6}V/cm$的高击穿场,2\ × 10^{7}cm/s$的高饱和电子漂移速度和4.9 $W/cm\cdot K$的优异导热系数。这些特性使得这种材料在器件设计中具有很大的吸引力,例如减少表面场(RESURF)技术,这是一种设计横向高压、低导通电阻器件的创新方法。我们展示了一个600V横向RESURF 4H-SiC MESFET,具有倾斜钝化,与传统的RF GaAs器件和硅LDMOS晶体管相比,它显示出更高的功率密度。漏极、源极和栅极采用倾斜场极板结构,在不牺牲正向导通电阻的情况下,降低表面电场,显著提高击穿电压,最高可达560V。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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