Great impact of RFC technology on fast recovery diode towards 600 V for low loss and high dynamic ruggedness

F. Masuoka, K. Nakamura, A. Nishii, T. Terashima
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引用次数: 22

Abstract

In the fast recovery operation of Free-wheeling Diode (FWD), to reduce voltage surge “snap-off”, we propose the Relaxed Field of Cathode (RFC)-planar anode diode in the range of 600 V to 1700 V. RFC effect is described by the parallel connection of pin diode and pnp transistor in as a single chip solution. Its structure is realized by our thin wafer process technology utilizing the backside lithography to make p/n alternating pattern after thining the wafer. As the result, our RFC diode up to 1700 V has the following three advantages comparing with the conventional one: (a) 40% lower recovery loss (EREC), 30% lower forward voltage drop (VF), (b) a large recovery Safe Operating Area (SOA) with the high peak power density of 1.4W/cm2 and (c) easiness to adjust a lower crosspoint below rated current density in the output I-V. Therefore, the proposed RFC diode has a great potential as the next generation Si FWD in the all voltage range.
RFC技术对600 V快速恢复二极管的低损耗和高动态坚固性有很大影响
在自由旋转二极管(FWD)的快速恢复工作中,为了减少电压浪涌“断源”,我们提出了600 ~ 1700 V范围内的阴极放松场(RFC)-平面阳极二极管。通过将引脚二极管和pnp晶体管并联作为单芯片解决方案来描述RFC效应。它的结构是由我们的薄晶片工艺技术,利用背面光刻,使p/n交替图案的晶圆薄后实现的。因此,与传统的RFC二极管相比,我们的高达1700 V的RFC二极管具有以下三个优点:(a)恢复损耗(EREC)降低40%,正向压降(VF)降低30%,(b)恢复安全工作区域(SOA)大,峰值功率密度为1.4W/cm2, (c)易于调整输出I-V中低于额定电流密度的较低交叉点。因此,所提出的RFC二极管在所有电压范围内作为下一代Si FWD具有很大的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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