Laser-induced deposition and etching of tungsten microstructures

K. Piglmayer, H. Schieche, R. Chabicovsky
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引用次数: 1

Abstract

Micron-sized deposition and etching of W in WF6 + H2 atmosphere is investigated by local laser-induced heating of thin tungsten layers on quartz substrates. The process is strongly dependent on the partial pressures of the two gases. A process with high amount of hydrogen permits deposition of W, whereas etching of W occurs if the working gas does not contain hydrogen.
激光诱导沉积和蚀刻钨微结构
研究了激光局部加热石英衬底上的钨薄层,在WF6 + H2气氛中进行微米级W的沉积和刻蚀。这一过程强烈地依赖于两种气体的分压。含有大量氢气的工艺允许W的沉积,而如果工作气体不含氢,则会发生W的蚀刻。
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