Application of circuit-level hot-carrier reliability simulation to memory design

P.M. Lee, T. Seo, K. Ise, A. Hiraishi, O. Nagashima, S. Yoshida
{"title":"Application of circuit-level hot-carrier reliability simulation to memory design","authors":"P.M. Lee, T. Seo, K. Ise, A. Hiraishi, O. Nagashima, S. Yoshida","doi":"10.1109/CICC.1997.606578","DOIUrl":null,"url":null,"abstract":"We have applied hot-carrier circuit-level simulation to entire circuits of a few thousand to over 12 K transistors using a simple but accurate degradation model for reliability verification of actual memory products. Previous published applications were small scale (few tens of transistors or individual circuit blocks) or for experimental purposes. By applying simulation to entire circuits, areas with worst degradation are not missed due to simulating only certain circuit blocks. Varying degradation depending upon actual products make accurate total-circuit simulation a crucial part of the early design process as technology advances into the deep sub-micron high clock rate regime.","PeriodicalId":111737,"journal":{"name":"Proceedings of CICC 97 - Custom Integrated Circuits Conference","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-05-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of CICC 97 - Custom Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.1997.606578","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

We have applied hot-carrier circuit-level simulation to entire circuits of a few thousand to over 12 K transistors using a simple but accurate degradation model for reliability verification of actual memory products. Previous published applications were small scale (few tens of transistors or individual circuit blocks) or for experimental purposes. By applying simulation to entire circuits, areas with worst degradation are not missed due to simulating only certain circuit blocks. Varying degradation depending upon actual products make accurate total-circuit simulation a crucial part of the early design process as technology advances into the deep sub-micron high clock rate regime.
电路级热载流子可靠性仿真在存储器设计中的应用
我们已经将热载子电路级模拟应用于几千到超过12 K晶体管的整个电路,使用简单但准确的退化模型来验证实际存储产品的可靠性。以前发表的应用是小规模的(几十个晶体管或单个电路块)或用于实验目的。通过对整个电路进行模拟,不会因为只模拟某些电路块而错过退化最严重的区域。随着技术发展到深亚微米高时钟速率,根据实际产品的不同退化使得精确的全电路仿真成为早期设计过程的关键部分。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信