Development and demonstration of equivalent material characteristics for microbump arrays utilized in failure estimation of chip-on-chip packaging

Chang-Chun Lee, Pei-Chen Huang, Bow-Tsin Chian
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引用次数: 3

Abstract

To meet the requirements of electronic devices having high operated speed, multi-functions, and a low form factor, a great classic shift of the system integration composed of heterogeneous and homogenous substances from two-dimensional (2D) to 2.5D or even 3D integration is a promising solution while a physical limit of nano-scaled transistors and the bottlenecks emerge of related fabricated technologies are confronted. To realize the foregoing architectures of 3D-ICs packaging, the interconnects, composed of through silicon via (TSV) and microbumps, have attracted a lot of attentions due to high density connections among stacked chips can be vertically achieved. However, as the layout arrangements of microbump arrays are taken into account, because of numerous microbumps with complicated compositions and a significant dimensional mismatch among them, the failure location and precise reliability estimation of a whole packaging structure are difficult to acquire by the simulated predictions directly. To resolve this problem, the methodology of equivalent material characteristics for microbump arrays extracted from finite element analysis (FEA) by using the way of usual bulk material tests is proposed in this study. To demonstrate the feasibility of above-mentioned approach, a testing vehicle of chip-on-chip packaging with wafer level underfills (WLUFs) is utilized to explore the applied influence of internal microbump arrays with equivalent material properties on the magnitude and contour of stresses at the critical locations where the detailed configurations of microbumps are still needed to construct in FEA under the loading of temperature cycling test. In addition, the present approach for equivalent material properties of microbumps combined with a global/local sub-modeling technique is also implemented and discussed, separately. Under the supposition of that the lead-free solder within a microbump is completely transferred to Ni3Sn4 intermetallic compound (IMC), the maximum principal stress of IMC layer based on the failure mode of brittle matter is used to judge the numerical convergence of FEA. The results indicate that at least four rows of real micrbumps originated from the outermost array edge of packaging structure are required to maintain the numerical accuracy as compared with the consequence obtained by a fully constructed simulated model. Moreover, it is found that a small deviation of 5 % in stress magnitude by using a sub-modeling technique can be managed when a distance of 60 μm between the edge of local model and concerned microbump is taken into account.
微碰撞阵列等效材料特性的开发和演示,用于芯片上封装的失效估计
为了满足电子器件高运行速度、多功能和低外形尺寸的要求,由异构和均质物质组成的系统集成从二维(2D)集成到2.5D甚至3D集成是一个很有前途的解决方案,同时也面临着纳米级晶体管的物理极限和相关制造技术的瓶颈。为了实现上述3d - ic封装架构,通过硅通孔(TSV)和微凸点组成的互连引起了人们的广泛关注,因为堆叠芯片之间可以垂直实现高密度连接。然而,在考虑微凸点阵列布局时,由于微凸点数量众多且组成复杂,且微凸点之间存在较大的尺寸失配,难以直接通过模拟预测获得整个封装结构的失效位置和精确的可靠性估计。为了解决这一问题,本文提出了采用常规体材试验方法提取微凸点阵列有限元分析等效材料特性的方法。为了验证上述方法的可行性,利用晶圆级底填片片上封装(WLUFs)测试车,在温度循环试验载荷下,探索具有等效材料特性的内部微凸点阵列在有限元分析中对仍需构建微凸点详细配置的关键位置的应力大小和轮廓的应用影响。此外,本文还对基于全局/局部子建模技术的微凸点等效材料特性求解方法进行了具体实现和讨论。假设微凸点内无铅焊料完全转变为Ni3Sn4金属间化合物(IMC),采用基于脆性物质破坏模式的IMC层最大主应力来判断有限元数值收敛性。结果表明,与完全构建的模拟模型相比,至少需要4排源自封装结构最外层阵列边缘的真实微凸点才能保持数值精度。此外,当局部模型边缘与相关微凸点之间的距离为60 μm时,采用子建模技术可以控制应力值5%的小偏差。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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