Effect of doping on optoelectronic properties of Tin dioxide layers produced by chemical deposition

H. Kangarlou, P. Esmaili
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引用次数: 2

Abstract

Tin dioxide and metallic impurity (Cu, Fe) doped stannic oxide Nano layers were produced by chemical bath deposition method on glass substrates. The effects of doping on optoelectronic properties of stannic oxide Nano layers were studied. Optical Reflectance measured in the wavelength range of 220-2500 nm by spectrophotometer. Other optical properties and optical band gaps were calculated using Kramers-Kronig relations on reflectivity curves. Electronic properties were calculated by full potential linearized augmented plane wave (FP-LAPW) method, within density functional theory (DFT). In this approach, the generalized gradient approximation (GGA) in the form of the LSDA functional was used for the exchange-correlation potential calculations. Band gap structures and density of states were calculated. Doping impurity changes optical properties of Tin dioxide layers. Metallic impurities, especially copper, decreases the band gap energy and increases conductivity of layers. Value of band gap calculated by DFT method for SnO2 compound obtained 1.2 eV. All results are in good agreement with each other.
掺杂对化学沉积二氧化锡层光电性能的影响
采用化学浴沉积法在玻璃衬底上制备了二氧化锡和金属杂质(Cu, Fe)掺杂的氧化锡纳米层。研究了掺杂对氧化锡纳米层光电性能的影响。用分光光度计测量220 ~ 2500nm波长范围内的光学反射率。利用反射率曲线上的Kramers-Kronig关系计算了其他光学性质和光带隙。利用密度泛函理论(DFT)中的全势线性化增广平面波(FP-LAPW)方法计算了电子性质。该方法采用LSDA泛函形式的广义梯度近似(GGA)进行交换相关势的计算。计算了带隙结构和态密度。掺杂杂质改变了二氧化锡层的光学性质。金属杂质,特别是铜,降低了带隙能量,增加了层的导电性。DFT法计算的SnO2化合物带隙值为1.2 eV。所有的结果都很一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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