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EUVL characteristics of indium-oxide-infiltrated PMMA hybrid photoresist synthesized by vapor-phase infiltration

International Conference on Extreme Ultraviolet Lithography 2022 Pub Date : 2022-11-11 DOI:10.1117/12.2643226
Ashwanth Subramanian, Nikhil Tiwale, Wonmoo Lee, K. Kisslinger, Ming Lu, A. Stein, Jiyoung Kim, C. Nam
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气相浸润法制备氧化铟- PMMA杂化光刻胶的EUVL特性
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International Conference on Extreme Ultraviolet Lithography 2022
International Conference on Extreme Ultraviolet Lithography 2022
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