INVESTIGATION OF NEW COMPOSITE MATERIALS IN THE PROCESS OF SELF-ALIGNED DOUBLE PATTERNING

Mathematical modeling in materials science of electronic component Pub Date : 2022-04-22 DOI:10.29003/m3101.mmmsec-2022/167-170

E. Tikhonova, Y. Gornev

引用次数: 0

Abstract

The paper presents a study of the structural parameters of new composite materials as hard masks in the process of self-aligned multipatterning. It was found that the film with titanium oxide had the best characteristic properties for the multipatterning process

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新型自对准双模复合材料的研究

本文研究了作为硬掩模的新型复合材料在自对准多模化过程中的结构参数。结果表明，氧化钛薄膜具有最佳的多图案化性能

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Mathematical modeling in materials science of electronic component

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