Thermal behaviour of magnetron sputtered tungsten and tungsten-boride thin films

Abstract

Magnetron sputtered tungsten and tungsten diboride nanofilms are proposed to be used in microelectronic devices. Methods of deposition for nanofilms on oxidized silicon followed by etching is among the techniques to be applied for production. However, physical-chemical interactions between various films need to be taken into account. Therefore, a complete surface and in-depth characterization of synthesized films is necessary. Tungsten and tungsten diboride nanofilms are deposited by magnetron sputtering technique, followed by plasma chemical and chemical etching. Characterization of the structures is separated in several main steps including surface morphology, analysis of element composition as well as characterization of thermal properties, including estimation of presence of thermally active emission centers and thermally induced chemical conversions.