In-situ ellipsometric study on composition-dependent short-wave HgCdTe in the process of molecular beam epitaxy growth

Liao Yang, Chuan Shen, Lu Chen, Li He
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Abstract

Hg1-xCdxTe is considered as the preferred material for high performance infrared photodetectors and imaging focal plane array (FPA) detectors. One of the technical challenges of multi-dimensional integrated HgCdTe epitaxy by molecular beam epitaxy (MBE) lies in the in-situ extraction, characterization and precisely control of a series of parameters such as alloy composition, surface roughness, substrate temperature and film thickness at a relatively low substrate temperature of about 180°C. Therefore, an in-situ, nondestructive spectroscopic ellipsometry (SE) method is needed to characterize the performance of HgCdTe films. In this paper, real time optical property characterization of short-wave Hg1-xCdxTe epitaxial grown by MBE is reported. Run to run feasibility and stability of in-situ SE is confirmed by buffer layer thickness verification in multiple growth runs. Lorentz oscillator parametric model provides a new approach to describe optical dispersion property of HgCdTe over spectral range of 1.5-4.1 eV. The absorption peaks show blue shift with the increase of HgCdTe Cd composition (x). Under this circumstance, the longitudinal x value for HgCdTe during epitaxy process can be obtained in real time without any surface damage by successfully building a composition-dependent optical constant library, with routine run-to-run reproducibility measurement accuracy Δx of ~ 0.0015. This work will facilitate the fabrication of HgCdTe heterojunctions with complex component distribution and doping profiles.
分子束外延生长过程中成分依赖短波HgCdTe的原位椭偏研究
Hg1-xCdxTe被认为是高性能红外探测器和成像焦平面阵列(FPA)探测器的首选材料。利用分子束外延技术(MBE)实现多维集成HgCdTe外延的技术挑战之一是在相对较低的衬底温度(约180℃)下,对合金成分、表面粗糙度、衬底温度和薄膜厚度等一系列参数进行原位提取、表征和精确控制。因此,需要一种原位、无损的椭偏光谱(SE)方法来表征HgCdTe薄膜的性能。本文报道了MBE生长的短波Hg1-xCdxTe外延的实时光学特性表征。通过多次生长试验对缓冲层厚度的验证,验证了原位SE的可行性和稳定性。洛伦兹振子参数模型为描述HgCdTe在1.5 ~ 4.1 eV光谱范围内的色散特性提供了新的方法。随着HgCdTe Cd成分(x)的增加,吸收峰出现蓝移。在这种情况下,通过成功建立与成分相关的光学常数库,可以实时获得外延过程中HgCdTe的纵向x值,而不会对表面造成损伤,常规运行-运行重复性测量精度Δx为~ 0.0015。这项工作将有助于制备具有复杂组分分布和掺杂谱的HgCdTe异质结。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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