GaN HFET for W-band Power Applications

M. Micovic, A. Kurdoghlian, P. Hashimoto, M. Hu, M. Antcliffe, P. Willadsen, W. Wong, R. Bowen, I. Milosavljevic, Adele E. Schmitz, M. Wetzel, David H. Chow
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引用次数: 102

Abstract

In this paper we report high frequency GaN power device and measured power performance of the first W-band (75 GHz-110 GHz) MMIC fabricated in GaN material system. The first W-band GaN MMIC with 150 mum of output gate periphery produces 316 mW of continuous wave output power (power density =2.1 W/m) at a frequency of 80.5 GHz and has associated power gain of 17.5 dB. By comparison the reported state of the art for other solid state technologies in W-band is 427 mW measured in a pulsed mode on an InP HEMT MMIC with 1600 mum of output periphery (power density = 0.26 W/mm). The reported result demonstrates tremendous superiority of GaN device technology for power applications at frequencies greater than 75 GHz
用于w波段功率应用的GaN HFET
本文报道了用GaN材料制得的首个w波段(75 GHz-110 GHz) MMIC高频GaN功率器件,并测量了其功率性能。第一个W波段GaN MMIC输出栅极外围为150毫微米,在80.5 GHz频率下产生316mw的连续波输出功率(功率密度=2.1 W/m),相关功率增益为17.5 dB。相比之下,其他固态技术在W波段的现有水平为427兆瓦,在脉冲模式下,在输出外围1600毫微米(功率密度= 0.26瓦/毫米)的InP HEMT MMIC上测量。报告的结果表明,GaN器件技术在频率大于75 GHz的功率应用中具有巨大的优势
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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