Electrical properties and thermal stability of Be-doped nonstoichiometric GaAs

R. Lutz, P. Specht, R. Zhao, E. Weber
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引用次数: 2

Abstract

Beryllium doping of arsenic rich GaAs grown by MBE at low temperatures (LT-GaAs) allows one to grow GaAs with ultrashort carrier lifetimes at growth temperatures of 250/spl deg/ to 300/spl deg/C. Hall effect and resistivity measurements showed that in as-grown samples hopping conduction can be suppressed in this growth temperature range. Semi-insulating behavior of as-grown LT-GaAs:Be can be achieved by careful adjustment of temperature and Be-doping. In addition, Be-doped LT-GaAs grown in this temperature range shows increased thermal stability of the arsenic antisite defects (As/sub Ga/).
be掺杂非化学计量GaAs的电学性能和热稳定性
铍掺杂MBE低温生长富砷GaAs (LT-GaAs),可以在250 ~ 300℃的生长温度下生长出载流子寿命极短的GaAs。霍尔效应和电阻率测量表明,在此生长温度范围内可以抑制生长样品的跳变传导。生长的LT-GaAs:Be的半绝缘性能可以通过仔细调节温度和Be掺杂来实现。此外,在此温度范围内生长的掺be的LT-GaAs显示出砷反位缺陷(As/sub Ga/)的热稳定性提高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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