Ion implanted InSb photodetectors

H. Betz, K. Wiedeburg, H. Ryssel, H. Kranz
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Abstract

Planar n+p- and p+n-photodetectors have been made in InSb by implantation of sulfur and beryllium, n+p-detectors show a flat response from 4.5 to 5.3 µm, resulting from the Burstein-Moss effect, whereas the p+n-detectors show the usual behavior of the response with a shift in the cutoff-wavelength from 4.8 to 5.5 µm depending on the substrate doping. The obtained peak detectivities are 3 × 1011cmHz1/2W-1for sulfur implanted and 1012cmHz1/2W-1for beryllium implanted diodes at a field of view of 0°. The corresponding externalquantum efficiencies are 40 to 60% for all detectors.
离子注入InSb光电探测器
平面n+p-和p+n-光电探测器已经在InSb中通过注入硫和铍制成,n+p-探测器由于Burstein-Moss效应在4.5到5.3µm范围内表现出平坦的响应,而p+n探测器则表现出通常的响应行为,随着衬底掺杂的不同,截止波长在4.8到5.5µm之间变化。在0°视场范围内,硫注入二极管的峰值检出率为3 × 1011cmhz1 / 2w -1,铍注入二极管的峰值检出率为1012cmhz1 / 2w -1。所有探测器对应的外部量子效率为40%至60%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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