Structural and Electrical Properties of Reaction Bonded Silicon Nitride Ceramics

Hosneara, A. Hasnat, A. H. Bhuyan
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引用次数: 3

Abstract

The effects of structural properties on the d.c. and a.c. electrical properties of different weight gain reaction bonded silicon nitride (RBSN) have been studied in this work. The degree of nitridation is assessed by the ‘weight gain’ of the ceramic, the percentage by which the weight is increased in the nitriding reaction. From X-ray diffraction (XRD) patterns, it is observed that a higher degree of nitriadation sample has strong -silicon nitride peaks. Intensity of -silicon nitride peaks decreases with decreasing weight gain. The higher degrees of nitridation, the samples have less significant Si peak. XRD patterns were recorded to calculate the lattice parameters of RBSN. The lattice parameters for three weight gain RBSN samples are found to be a =b = 7.7727 Å, c= 5.6565 Å (26% weight gain), a=b= 7.6272 Å, c= 5.6374 Å (42% weight gain) and a=b=7.6158 Å, c= 5.7732 Å (58.27% weight gain) and are in good agreement with the reported values from XRD patterns. Porosity (%) and surface morphology was observed by SEM.
反应键合氮化硅陶瓷的结构与电学性能
本文研究了不同增重反应键合氮化硅(RBSN)的结构特性对其直流和交流电学性能的影响。氮化程度是通过陶瓷的“增重”来评估的,即在氮化反应中重量增加的百分比。x射线衍射(XRD)结果表明,高氮化程度的样品具有较强的-氮化硅峰。氮化硅峰强度随增重的减小而减小。氮化程度越高,样品的Si峰越不明显。记录XRD谱图,计算RBSN的晶格参数。三种增重RBSN样品的晶格参数分别为a=b= 7.7727 Å, c= 5.6565 Å(增重26%),a=b= 7.6272 Å, c= 5.6374 Å(增重42%)和a=b=7.6158 Å, c= 5.7732 Å(增重58.27%),与XRD谱图吻合较好。用SEM观察了孔隙率(%)和表面形貌。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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