Perveance characteristics of intense electron beams in high power cylindrical diodes

K. Y. Sung, W. Jeon, S. H. Chun, K. B. Song, Y. Jung, M.C. Choi, Y. Seo, E. Choi
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Abstract

When an electron beam is generated from a cathode, an electron sheath plasma is also generated so that perveance of the diode is varied and changes the diode output characteristics. In our pulse power system "Chundoong" (Max 600 kV, 88 kA, 60 ns), the perveance value have been experimentally investigated and estimated from diode voltage and diode current. In this experiment, the anode- cathode (A-K) gap distance d has been varied from 4 mm to 10 mm. It is noted in this experiment that the diode perveance characteristics could be described as 7.0/spl times/10/sup -9//d/sup 1.82/. The sheath plasma expansion speed has also been estimated from the experiment, which is to be about 7 cm/us under A-K gap distance 4 mm.
强电子束在高功率圆柱二极管中的性能特性
当电子束从阴极产生时,也会产生电子鞘等离子体,从而改变二极管的性能并改变二极管的输出特性。在我们的脉冲电源系统“春洞”(最大600 kV, 88 kA, 60 ns)中,用二极管电压和二极管电流对其性能值进行了实验研究和估计。在本实验中,阳极-阴极(A-K)间隙距离d从4mm变化到10mm。在本实验中,二极管的性能特性可以描述为7.0/spl倍/10/sup -9//d/sup 1.82/。通过实验估计出鞘层等离子体在A-K间隙距离为4 mm时的膨胀速度约为7 cm/us。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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