Sputtering Deposited Ta/Si Soft X-ray Multilayer Mirror

Soft-X-Ray Projection Lithography Pub Date : 1900-01-01 DOI:10.1364/sxray.1992.pd6

Shao Jianda, Fan Zhengxiu

引用次数: 0

Abstract

30 layers of Ta/Si alternative structure prepared by plane magneton sputtering has been ehoosen for 234A x-ray mirror. Its characterizations indicated that it is expected to get the real reflectivity of about 10%.

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溅射沉积Ta/Si软x射线多层反射镜

采用平面磁控溅射法制备了30层Ta/Si交替结构，用于234A x射线反射镜。其特性表明，实际反射率有望达到10%左右。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Soft-X-Ray Projection Lithography

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