C. H. Diaz, K. Fung, S.M. Cheng, K. Cheng, S.W. Wang, H. Huang, Y. Leung, M. Tsai, C.C. Wu, C.C. Lin, Mi-Chang Chang, D. Tang
{"title":"Device properties in 90 nm and beyond and implications on circuit design","authors":"C. H. Diaz, K. Fung, S.M. Cheng, K. Cheng, S.W. Wang, H. Huang, Y. Leung, M. Tsai, C.C. Wu, C.C. Lin, Mi-Chang Chang, D. Tang","doi":"10.1109/IEDM.2003.1269162","DOIUrl":null,"url":null,"abstract":"To reconcile scaling-driven fundamental material limitations with industry evolution requirements, flexible CMOS technologies and tighter interaction between process development and circuit/system design are needed to efficiently realize Systems on a Chip (SoC). This paper discusses issues associated with power supply scaling, performance-leakage power optimization, gate dielectric scaling, strain-Si enhancement and I/O support.","PeriodicalId":344286,"journal":{"name":"IEEE International Electron Devices Meeting 2003","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Electron Devices Meeting 2003","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2003.1269162","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
To reconcile scaling-driven fundamental material limitations with industry evolution requirements, flexible CMOS technologies and tighter interaction between process development and circuit/system design are needed to efficiently realize Systems on a Chip (SoC). This paper discusses issues associated with power supply scaling, performance-leakage power optimization, gate dielectric scaling, strain-Si enhancement and I/O support.