5nm FinFET Standard Cell Library Optimization and Circuit Synthesis in Near-and Super-Threshold Voltage Regimes

Q. Xie, X. Lin, Yanzhi Wang, M. Dousti, A. Shafaei, Majid Ghasemi-Gol, Massoud Pedram
{"title":"5nm FinFET Standard Cell Library Optimization and Circuit Synthesis in Near-and Super-Threshold Voltage Regimes","authors":"Q. Xie, X. Lin, Yanzhi Wang, M. Dousti, A. Shafaei, Majid Ghasemi-Gol, Massoud Pedram","doi":"10.1109/ISVLSI.2014.101","DOIUrl":null,"url":null,"abstract":"FinFET device has been proposed as a promising substitute for the traditional bulk CMOS-based device at the nanoscale, due to its extraordinary properties such as improved channel controllability, high ON/OFF current ratio, reduced short-channel effects, and relative immunity to gate line-edge roughness. In addition, the near-ideal subthreshold behavior indicates the potential application of FinFET circuits in the near-threshold supply voltage regime, which consumes an order of magnitude less energy than the regular strong-inversion circuits operating in the super-threshold supply voltage regime. This paper presents a design flow of creating standard cells by using the FinFET 5nm technology node, including both near-threshold and super-threshold operations, and building a Liberty-format standard cell library. The circuit synthesis results of various combinational and sequential circuits based on the 5nm FinFET standard cell library show up to 40X circuit speed improvement and three orders of magnitude energy reduction compared to those of 45nm bulk CMOS technology.","PeriodicalId":405755,"journal":{"name":"2014 IEEE Computer Society Annual Symposium on VLSI","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"35","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE Computer Society Annual Symposium on VLSI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISVLSI.2014.101","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 35

Abstract

FinFET device has been proposed as a promising substitute for the traditional bulk CMOS-based device at the nanoscale, due to its extraordinary properties such as improved channel controllability, high ON/OFF current ratio, reduced short-channel effects, and relative immunity to gate line-edge roughness. In addition, the near-ideal subthreshold behavior indicates the potential application of FinFET circuits in the near-threshold supply voltage regime, which consumes an order of magnitude less energy than the regular strong-inversion circuits operating in the super-threshold supply voltage regime. This paper presents a design flow of creating standard cells by using the FinFET 5nm technology node, including both near-threshold and super-threshold operations, and building a Liberty-format standard cell library. The circuit synthesis results of various combinational and sequential circuits based on the 5nm FinFET standard cell library show up to 40X circuit speed improvement and three orders of magnitude energy reduction compared to those of 45nm bulk CMOS technology.
近阈值和超阈值电压下5nm FinFET标准电池库优化和电路合成
FinFET器件由于其非凡的特性,如改进的沟道可控性、高的ON/OFF电流比、减少的短沟道效应以及相对抗栅极线边缘粗糙度,已被提出作为传统cmos器件在纳米尺度上的有前途的替代品。此外,近理想的亚阈值特性表明了FinFET电路在近阈值供电电压下的潜在应用,它比在超阈值供电电压下工作的常规强反转电路消耗的能量少一个数量级。本文介绍了使用FinFET 5nm技术节点创建标准单元的设计流程,包括近阈值和超阈值操作,并构建了liberty格式标准单元库。基于5nm FinFET标准单元库的各种组合和顺序电路的电路合成结果显示,与45nm块体CMOS技术相比,电路速度提高了40倍,能量降低了3个数量级。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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