A model of three phase inverter hybrid IC with 60 V/150 A MOSFET

K. Okawa, Y. Igarashi, H. Shimizu, M. Kajihara, K. Sugai
{"title":"A model of three phase inverter hybrid IC with 60 V/150 A MOSFET","authors":"K. Okawa, Y. Igarashi, H. Shimizu, M. Kajihara, K. Sugai","doi":"10.1109/IAS.1995.530393","DOIUrl":null,"url":null,"abstract":"Utilizing the insulated metal substrate technology (IMST), a new 60 V/150 A inverter IC has been developed. At present, a single substrate inverter IC is limited to 75 A for its maximum current carrying capacity, and its applications are primarily in high voltage commercial area. Power utilization of devices for such applications are relatively high and have little influence on the system performance since the supply voltage is much higher in comparison with ON-state saturation voltage of power devices. Unlikely, for battery powered applications where supply voltage and power utilization are low, thus selections of proper power devices are essential to build a better inverter system since the degree of power utilization in inverter ICs determines the performance of the inverter system. Because of the resistance of substrate pattern also has a significant influence on the system performance, the authors increased the thickness of copper foil to twice of the current models. Despite increased thickness, the authors maintained the present fine pattern pitch by the adoption of a new etching process, and succeeded the development of a new high density assembly substrate. Being able to adopt low on-resistance power devices and thick pattern traces, as a result the unit became compact and performed as per design.","PeriodicalId":117576,"journal":{"name":"IAS '95. Conference Record of the 1995 IEEE Industry Applications Conference Thirtieth IAS Annual Meeting","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IAS '95. Conference Record of the 1995 IEEE Industry Applications Conference Thirtieth IAS Annual Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IAS.1995.530393","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Utilizing the insulated metal substrate technology (IMST), a new 60 V/150 A inverter IC has been developed. At present, a single substrate inverter IC is limited to 75 A for its maximum current carrying capacity, and its applications are primarily in high voltage commercial area. Power utilization of devices for such applications are relatively high and have little influence on the system performance since the supply voltage is much higher in comparison with ON-state saturation voltage of power devices. Unlikely, for battery powered applications where supply voltage and power utilization are low, thus selections of proper power devices are essential to build a better inverter system since the degree of power utilization in inverter ICs determines the performance of the inverter system. Because of the resistance of substrate pattern also has a significant influence on the system performance, the authors increased the thickness of copper foil to twice of the current models. Despite increased thickness, the authors maintained the present fine pattern pitch by the adoption of a new etching process, and succeeded the development of a new high density assembly substrate. Being able to adopt low on-resistance power devices and thick pattern traces, as a result the unit became compact and performed as per design.
采用60 V/150 A MOSFET的三相逆变混合集成电路模型
利用绝缘金属衬底技术(IMST),研制了一种新型60v / 150a逆变器集成电路。目前,单基板逆变IC的最大载流能力限制在75a以内,其应用主要在高压商用领域。此类应用器件的功率利用率较高,对系统性能影响不大,因为电源电压比功率器件的on状态饱和电压高得多。不太可能,对于电池供电的应用,供电电压和功率利用率低,因此选择合适的功率器件对于构建更好的逆变器系统至关重要,因为逆变器ic中的功率利用率决定了逆变器系统的性能。由于衬底图案的电阻对系统性能也有显著的影响,作者将铜箔的厚度增加到现有模型的两倍。在厚度增加的情况下,采用一种新的蚀刻工艺,保持了现有的精细图案间距,成功地开发了一种新的高密度组装基板。由于能够采用低导通电阻功率器件和厚模式走线,因此该单元变得紧凑并按设计执行。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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