Graphene as a Metal without the Negative Dielectric Constant in the Designed Mono – Layer Graphene Waveguide at a Chemical Potential of 450meV

S. Bobba
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Abstract

Graphene's electronic properties come from its halffilled band structure formed from the $\pi$ -bond which hybridizes together to form the $\pi$-band and $\pi^{\ast}$-bands. Due to its almost zero bandgap, Graphene can be tuned as a metal by applying a chemical potential to the 2D material, as it has high electron mobility at atomic level thickness. Using this property, Graphene was tuned to chemical potentials from 350meV − 500meV, where it showed semi-conductor behaviour below 400meV and metallic behaviour above 450meV. The Group III and V elements of the periodic table combine well to bond with Graphene due to their sp2 hybridisation and hexagonal crystalline bonding, and this property was further used in building a mono-layer Graphene waveguide structure using silicon nitride as the outer core, silica as the substrate and air as the cladding, to further investigate the behaviour of Graphene as a metal. The modal solutions in this structure were obtained by solving the full-vectorial H-field formulation using the finite element method (FEM) which showed the hybrid plasmonic mode generation at the silicon nitride-graphene-silica interface, thereby confirming the behaviour of Graphene as a metal at 450meV without its negative dielectric constant. This however contradicts the surface plasmon theory which states that at a metal-dielectric surface, surface plasmon polaritons (SPP's) are only formed if k1/k2 = −ε1/ε2 is satisfied. This work needs further experimental evaluation to confirm the behaviour of Graphene as a metal without the negative dielectric constant at 450meV as it would then open doors to a new understanding of solid-state physics, thereby leading to new applications in this field of science.
在化学势为450meV的单层石墨烯波导中,石墨烯作为无负介电常数的金属
石墨烯的电子特性来自于它由$\pi$-键形成的半填充带结构,它杂化在一起形成$\pi$-带和$\pi^{\ast}$-带。由于其几乎为零的带隙,石墨烯可以通过对二维材料施加化学势来调谐为金属,因为它在原子级厚度上具有高电子迁移率。利用这一特性,石墨烯的化学势在350meV - 500meV之间,在400meV以下表现出半导体行为,在450meV以上表现出金属行为。元素周期表中的III族和V族元素由于其sp2杂化和六角形结晶键能很好地与石墨烯结合,这一特性进一步被用于构建单层石墨烯波导结构,该结构以氮化硅为外核,二氧化硅为衬底,空气为包层,以进一步研究石墨烯作为金属的行为。利用有限元法求解全矢量h场公式,得到了该结构的模态解,显示了氮化硅-石墨烯-二氧化硅界面上混合等离子体模态的产生,从而证实了石墨烯作为金属在450meV时没有负介电常数的行为。然而,这与表面等离子体理论相矛盾。表面等离子体理论认为,在金属介质表面,表面等离子体极化子(SPP’s)只有在满足k1/k2 = - ε1/ε2时才会形成。这项工作需要进一步的实验评估,以确认石墨烯作为一种没有负介电常数的金属在450meV下的行为,因为它将为对固态物理学的新理解打开大门,从而导致该科学领域的新应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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