Performance evaluation of optimized transistor networks built using independent-gate FinFET

Andres M. A. Valdes, V. Possani, F. Marranghello, A. Reis, R. Ribas
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引用次数: 1

Abstract

MOS planar technology has been used in fabrication of integrated circuits in the last decades. However, the short channel effects in the subthreshold operation region are becoming a critical restriction to the channel length reduction. With the use of FinFET devices, the scaling increases due the reduction of short channel effects. FinFET offers the possibility of independent gate controlling that can be efficiently exploited in logic reduction (network optimization), but with direct impact in the electrical performance of logic gates. In this work, it is presented the electrical analysis in terms of signal delay propagation and energy consumption of compacted transistor networks. Different logic gate implementations corresponding to the same Boolean function behavior are compared. The results demonstrate the existing tradeoff between these two parameters.
使用独立栅极FinFET构建的优化晶体管网络的性能评估
近几十年来,MOS平面技术已广泛应用于集成电路的制造。然而,阈下操作区域的短信道效应正成为信道长度减小的关键制约因素。随着FinFET器件的使用,由于短通道效应的减少,标度增加。FinFET提供了独立门控制的可能性,可以有效地用于逻辑简化(网络优化),但直接影响逻辑门的电气性能。本文从信号延迟传播和能量消耗的角度对晶体管网络进行了电学分析。比较了对应于相同布尔函数行为的不同逻辑门实现。结果表明这两个参数之间存在权衡。
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