Optimization of Vertical GaN SGT-MOSFET for Low Ron

N. Jaiswal, V. N. Ramakrishnan, Sukhendu deb Roy
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引用次数: 2

Abstract

We present a new 600 V breakdown optimized vertical GaN Split-Gate Trench power MOSFET (SGTMOSFET) device with significantly reduced specific on-resistance and lower reverse capacitance. Using TCAD numerical simulations, we demonstrate that the SGTMOSFET exhibits about 30% lower specific on-resistance and about five times reduction in the reverse capacitance when compared to a conventional TG-MOSFET with similar breakdown voltage.
低功耗垂直GaN SGT-MOSFET的优化
我们提出了一种新的600 V击穿优化的垂直GaN分栅沟槽功率MOSFET (SGTMOSFET)器件,具有显着降低的比导通电阻和更低的反向电容。使用TCAD数值模拟,我们证明了与具有相似击穿电压的传统TG-MOSFET相比,SGTMOSFET的比导通电阻降低了约30%,反向电容降低了约5倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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