The Influence of Preparation Parameters on Structural and Optical Properties of N-Type Porous Silicon

Kawther M'hammedi, Noueddine Gabouze
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Abstract

In this paper, we describe the formation of macroporous silicon (MPS) formed anodically polarized on n type Si (100) substrates at a constant current density under front side illumination using two electrolytes, HF/Ethanol and HF/Ethanol/H2O2. The effect of adding H2O2 in the solution on the resulting pores were investigated by scanning electron microscopy (SEM), infrared spectroscopy (FTIR), contact angle measurements and UV-vis spectrophotometry. The results showed that for the anodization conditions the MPS formed in peroxide based (H2O2)/HF/Ethanol solution exhibited structures with larger pore size and different pore morphologies depending on the etching time than those formed in HF/Ethanol. The pore density and the pore size of the MPS samples increased with the etching time. The infrared absorption spectrum (FTIR) carried out on the freshly prepared sample indicates that the MPS contains Si-Hx bonds which decrease with increasing the etching time. Finally, measurements of contact angle indicate that the formed MPS samples are highly hydrophobic.
制备参数对n型多孔硅结构和光学性能的影响
在本文中,我们描述了在恒电流密度下,在正面照明下,使用HF/乙醇和HF/乙醇/H2O2两种电解质在n型Si(100)衬底上阳极极化形成大孔硅(MPS)。通过扫描电镜(SEM)、红外光谱(FTIR)、接触角测量和紫外-可见分光光度法研究了溶液中加入H2O2对气孔的影响。结果表明,在阳极氧化条件下,过氧化氢/氢氟酸/乙醇溶液中形成的MPS比在氢氟酸/乙醇溶液中形成的MPS具有更大的孔径和不同的孔形态,这取决于蚀刻时间。随着刻蚀时间的延长,MPS样品的孔隙密度和孔径均增大。对新制备的样品进行红外吸收光谱(FTIR)分析表明,MPS中含有Si-Hx键,随蚀刻时间的增加而减少。最后,接触角的测量表明,形成的MPS样品是高度疏水的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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