Off Stoichiometric Silicon Oxide Applied to Enhance the Silicon Responsivity up to UV Region

M. Aceves-Mijares, D. Berman, L. R. Berriel, C. Domínguez, A. Morales, J. Pedraza
{"title":"Off Stoichiometric Silicon Oxide Applied to Enhance the Silicon Responsivity up to UV Region","authors":"M. Aceves-Mijares, D. Berman, L. R. Berriel, C. Domínguez, A. Morales, J. Pedraza","doi":"10.1109/SENSORCOMM.2007.72","DOIUrl":null,"url":null,"abstract":"Silicon Rich Oxide (SRO) is a material compatible with silicon integrated technology, besides it has photoluminescentproperties. When SRO is illuminated with UV radiation emission in the range of 600 to 800 nm take place. This radiation has been applied to a silicon PN junction in order to expand the capabilities of silicon improving its detection properties. In this work a more precise characterization of a sensor made of silicon and SRO is done. The response of this sensor goes from 200 nm to standard Si detection range, and in the range of 200 to 400 nm it increases with the wavelength.","PeriodicalId":161788,"journal":{"name":"2007 International Conference on Sensor Technologies and Applications (SENSORCOMM 2007)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 International Conference on Sensor Technologies and Applications (SENSORCOMM 2007)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SENSORCOMM.2007.72","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Silicon Rich Oxide (SRO) is a material compatible with silicon integrated technology, besides it has photoluminescentproperties. When SRO is illuminated with UV radiation emission in the range of 600 to 800 nm take place. This radiation has been applied to a silicon PN junction in order to expand the capabilities of silicon improving its detection properties. In this work a more precise characterization of a sensor made of silicon and SRO is done. The response of this sensor goes from 200 nm to standard Si detection range, and in the range of 200 to 400 nm it increases with the wavelength.
非化学计量氧化硅用于提高硅对紫外区的响应性
富硅氧化物(SRO)不仅具有光致发光的特性,而且是一种与硅集成技术兼容的材料。当SRO被紫外线照射时,会产生600 ~ 800nm范围内的辐射。这种辐射已被应用于硅PN结,以扩大硅的能力,提高其检测性能。在这项工作中,对硅和SRO制成的传感器进行了更精确的表征。该传感器的响应范围从200 nm到标准Si检测范围,在200 ~ 400 nm范围内随波长增加而增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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