{"title":"Synthesis of ultrathin diamond film on fused silica substrate","authors":"Tianliang Hao, Chengru Shi","doi":"10.1117/12.300666","DOIUrl":null,"url":null,"abstract":"A technique of ultrasonic surface pretreatment in diamond powder slurry to enhance diamond nucleation has been developed. Under appropriate pretreatment and growth conditions, diamond grain densities of approximately 1010 cm-2 have been obtained on fused silica substrates. The synthesis technique of ultrathin diamond film on fused silica substrates by a hot filament chemical vapor deposition was studied, and high quality ultrathin diamond films with smooth surface were obtained. The optical transmittance of the film with a thickness of approximately 0.3 micrometer on fused silica substrate reached as high as 68% at wavelength of 800 nm.","PeriodicalId":362287,"journal":{"name":"Thin Film Physics and Applications","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Film Physics and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.300666","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
A technique of ultrasonic surface pretreatment in diamond powder slurry to enhance diamond nucleation has been developed. Under appropriate pretreatment and growth conditions, diamond grain densities of approximately 1010 cm-2 have been obtained on fused silica substrates. The synthesis technique of ultrathin diamond film on fused silica substrates by a hot filament chemical vapor deposition was studied, and high quality ultrathin diamond films with smooth surface were obtained. The optical transmittance of the film with a thickness of approximately 0.3 micrometer on fused silica substrate reached as high as 68% at wavelength of 800 nm.