Applications of extended depth of focus technology to light microscope systems

S. Bradburn, W. Cathey, E. Dowski
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引用次数: 1

Abstract

Previous research has demonstrated the success of using a cubic phase mask in optical systems to perform wavefront coding which, along with digital post-processing can extend the depth of focus of standard optical imaging systems [1, 2]. Experimental images have demonstrated an increase of six to eight times the depth of focus of standard systems when using the extended depth of focus technology. This technology is now being extended to high magnification or light microscope systems. Several challenges have arisen due to the special nature of light microscope systems but extended depth of focus (EDF) technology is still found to be useful in such systems.
扩展聚焦深度技术在光学显微镜系统中的应用
先前的研究已经证明,在光学系统中使用立方相位掩模进行波前编码是成功的,它与数字后处理一起可以扩展标准光学成像系统的聚焦深度[1,2]。实验图像表明,当使用扩展聚焦深度技术时,标准系统的聚焦深度增加了6到8倍。这项技术现在正被扩展到高倍光学显微镜系统。由于光学显微镜系统的特殊性,一些挑战已经出现,但扩展聚焦深度(EDF)技术仍然被发现是有用的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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