Infrared Absorption Spectra of Compensated Single Crystal Silicon using a Fourier Transform Spectrometer

D. Mead
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引用次数: 0

Abstract

The infrared absorption spectra of crystalline silicon containing some impurities have been studied in the 200 to 2000 cm−1 region using Fourier transform infrared (FTIR) techniques. The excitation spectra associated with the group III acceptor impurities boron and indium and the group V donors, antimony and phosphorus, have been studied at helium temperatures. Fig. 1 shows the schematic and highly simplified energy momentum diagram, and the various electronic transitions due to shallow donors and acceptor (hole transition) centers. Fig. 2 shows the room and 15K spectra of compensated silicon some 0.12 inches thick. The most significant change in the low temperature spectrum is the decrease in absorption and the addition of intense bands in the far infrared region. Fig. 3 shows an expanded plot of two samples at 15K in the 450-150 cm−1 region, in which the P3/2 set of transitions for boron are observed. A line seen at 316.1 cm−1 is that of phosphorus, which may be compared to previous measurements [1] using grating spectrometers.
用傅立叶变换光谱仪补偿单晶硅的红外吸收光谱
用傅里叶变换红外(FTIR)技术研究了含杂质晶体硅在200 ~ 2000 cm−1波段的红外吸收光谱。研究了氦温度下III族受体杂质硼、铟和V族给体锑、磷的激发光谱。图1显示了示意图和高度简化的能量动量图,以及由于浅层供体和受体(空穴跃迁)中心导致的各种电子跃迁。图2显示了约0.12英寸厚的补偿硅的房间和15K光谱。低温光谱中最显著的变化是吸收的减少和远红外区强波段的增加。图3显示了两个样品在15K时在450-150 cm−1区域的扩展图,其中观察到硼的P3/2组跃迁。在316.1 cm−1处看到的一条线是磷的线,这可以与以前使用光栅光谱仪的测量结果[1]进行比较。
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