Modeling the Probabilities of Failures of 22 nm CMOS Logic Cells

A. Beg
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引用次数: 1

Abstract

In this paper, we present mathematical models of the failure probabilities of individual MOS transistors. We use the models to characterize the failures of a few common CMOS logic cells. The failure models for the cells accurately represent the probabilities by considering the transistor dimensions, the supply voltage level, the input voltage level, and the variations in threshold voltages. We also demonstrate how the models can be utilized to analyze the sensitivities of cells' failure probabilities to their transistor sizes. Using scatter-plots, we observed a strong correlation between individual transistors' probabilities and their sizes, the cells, however, exhibited mixed sets of correlations, i.e., strong and weak. The presented modeling and analysis techniques are applicable to any CMOS logic cell operating between nearthreshold and nominal voltages.
22纳米CMOS逻辑单元失效概率建模
在本文中,我们提出了单个MOS晶体管失效概率的数学模型。我们使用这些模型来描述几种常见的CMOS逻辑单元的故障。通过考虑晶体管尺寸、电源电压水平、输入电压水平和阈值电压的变化,电池的失效模型准确地表示了概率。我们还演示了如何利用这些模型来分析电池失效概率对其晶体管尺寸的敏感性。使用散点图,我们观察到单个晶体管的概率和它们的尺寸之间有很强的相关性,然而,这些细胞表现出混合的相关性,即强和弱。所提出的建模和分析技术适用于在近阈值电压和标称电压之间工作的任何CMOS逻辑单元。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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