Investigation of electrical contacts on a nanometer scale using a Nano-manipulator in Scanning Electron Microscope

T. Kondo, J. Toyoizumi, M. Onuma, Tetsuo Shimizu, S. Kawabata, N. Watanabe, K. Mori
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引用次数: 3

Abstract

The indentation using tin oxide film which was deposited on tin substrate was executed by a tungsten probe whose curvature was about 5 micro meter in radius with a nano-manipulator in Scanning Electron Microscope. We measured contact resistance and the load force simultaneously, found cracks of tin oxide layer and tin penetration into the cracks and investigated in detail the correlation between indented surface morphology and electrical resistance characteristics with respect to load force by changing indentation depth. In case of 100 nm oxide film, abrupt electrical resistance decrease was observed by applying load force about 1.0×10-3N. The increase of tin penetration area on indented surface correlated with the abrupt electrical resistance decrease. This directly indicated that tin penetration into the cracks and tin appearances on the oxide surface were crucial phenomena for reliable electrical contact. Nano-manipulator used in this study was a powerful instrument for basic research of electrical contacts and realization of the miniaturized and lower load force connector.
扫描电镜下纳米机械臂对纳米尺度电触点的研究
在扫描电子显微镜下,采用半径为5微米的钨探针和纳米机械臂对沉积在锡衬底上的氧化锡薄膜进行压痕。同时测量了接触电阻和负载力,发现了氧化锡层的裂纹和锡的渗透,并通过改变压痕深度,详细研究了压痕表面形貌与电阻特性随负载力的关系。在100 nm的氧化膜中,施加1.0×10-3N左右的负载力,观察到电阻突然下降。压痕表面锡渗透面积的增大与电阻的骤减有关。这直接表明锡渗入裂纹和锡在氧化物表面的出现是可靠电接触的关键现象。本研究采用的纳米机械臂是电接触基础研究和实现微型化、低载荷力连接器的有力工具。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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