High pressure solution growth and physical properties of GaN crystals

I. Grzegory
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引用次数: 0

Abstract

The recent results in high pressure crystallization of GaN from the solutions of N in pure Ga and in its alloys with II group metals (Mg, Ca, Zn) are discussed. It is shown that high resistivity (10/sup 4/-10/sup 6/ /spl Omega/cm) GaN crystals of improved structural quality can be grown from solutions containing Mg. The structural, electrical and optical properties properties of GaN crystals grown without and with the intentional doping are compared. It is also shown that atomically flat, thermally stable surfaces of GaN substrates can be obtained by mechanical and mechano-chemical polishing. Some most interesting results concerning homoepitaxial growth by MOCVD and MBE are reviewed.
氮化镓晶体的高压溶液生长和物理性质
本文讨论了氮在纯镓及其与II族金属(Mg, Ca, Zn)的合金中高压结晶的最新研究结果。结果表明,在含有Mg的溶液中可以生长出结构质量提高的高电阻率(10/sup 4/-10/sup 6/ /spl ω /cm) GaN晶体。比较了有意掺杂和没有掺杂的GaN晶体的结构、电学和光学性质。研究还表明,通过机械抛光和机械化学抛光可以获得原子平坦、热稳定的GaN衬底表面。本文综述了MOCVD和MBE在同外延生长方面的一些最新研究成果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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