Effect of Ar pressure on the magnetic properties of Fe-Si/sub 3/N/sub 4/ thin film prepared by Co-sputtering

Abstract

Fe and Co-based thm films with amorphous stmcture [I] or nanoaystallme phase [2], whlch exhibit good soft magnehc properties up to 10 MHz, were developed. However, with a further demand for the miniaturization of elecfmmagmtic devices, active research is now under way to develop thin films exhibiting good soft magnetic properties up to 100 MHZ or GHz For applicabon granular films consisting of metallic magnetic grains surrounded by an intergranular phase with high elecmcal resistivity in order to reduce the eddy current loss are of great interest[3]. In this shldy we are reporting the effect of Ar pressure on the soft magnebc properties of Fe-SilNn thm films prepared by co-sputtcring technique