Characteristics comparison of standard logic and HVCMOS processed SGLC embedded NVM

Sung-Kun Park, Nam-Yoon Kim, Kwang-il Choi, Jae-Gwan Kim, I. Cho, K. Yoo, Eun-Mee Kwon, Sangyong Kim
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引用次数: 2

Abstract

The novel select gate lateral coupling (SGLC) cell has a single poly structure and operates using a lateral coupling between the floating gate (FG) and the select gate (SG) without additional processes on a base platform. In this paper, we have fabricated a pure logic CMOS processed SGLC cell for the first time and compared it with an HVCMOS processed SGLC cell. Because of the thinner gate oxide, the pure logic process fabricated SGLC cell has a lower coupling value than that of the HVCMOS process fabricated cell. However, the logic CMOS process fabricated cell shows a higher current performance than the HVCMOS process fabricated cell having a thicker gate oxide. Thanks to the inverse relationship between the coupling ratio and cell current, and the additional back bias effect, the logic CMOS processed cell gives comparable performance in terms of the programming speed, program-erase threshold voltage (VT) window and cell current. Both types of cells show more than 10 years of data retention lifetime at 85°C.
标准逻辑和HVCMOS处理的SGLC嵌入式NVM特性比较
新型的选择栅横向耦合(SGLC)电池具有单一的多晶硅结构,并使用浮栅(FG)和选择栅(SG)之间的横向耦合来工作,而无需在基础平台上进行额外的处理。本文首次制作了纯逻辑CMOS处理的SGLC电池,并将其与HVCMOS处理的SGLC电池进行了比较。由于栅极氧化物更薄,纯逻辑工艺制造的SGLC电池的耦合值比HVCMOS工艺制造的电池低。然而,逻辑CMOS工艺制造的电池比具有更厚栅极氧化物的HVCMOS工艺制造的电池具有更高的电流性能。由于耦合比和电池电流之间的反比关系,以及额外的反偏置效应,逻辑CMOS处理的电池在编程速度、程序擦除阈值电压(VT)窗口和电池电流方面具有相当的性能。在85°C下,两种类型的电池都显示出超过10年的数据保留寿命。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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