Thermal Stability of Thin AU Films Deposited on Salt Whiskers

Ehud Almog, V. Derkach, Amit L. Sharma, A. Novick-Cohen, J. Greer, E. Rabkin
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引用次数: 5

Abstract

Abstract Thin metal films deposited on patterned or rough substrates play an increasing role in microelectronics, sensing, catalysis, and other areas of nanotechnology. However, the thermal stability and solid state dewetting of thin metal films with complex three-dimensional architecture is still poorly understood. In this work we employed a model system of nanocrystalline Au thin films deposited on prismatic single crystalline KCl whiskers to study the solid state dewetting of thin films in a three-dimensional setting. The arrays of KCl whiskers were grown on porous substrates under well-defined humidity and temperature conditions. Single crystalline prismatic KCl whiskers with a very high aspect ratio, [001] axis and {100} side facets were obtained. The whiskers were coated with thin conformal Au films of 20-30 nm in thickness. The annealing of these core-shell whiskers at the temperature of 350oC resulted in solid state dewetting of the Au film, with the dewetting processes occurring much faster along the whisker edges than on the side facets. The orientation relationships between Au and KCl were determined by employing similarly prepared thin Au films deposited on the flat KCl (100) substrates. Inspired by our experimental results, we developed a numerical model describing the curvature-gradient driven and surface diffusion-controlled growth of a hole in the thin film deposited on a curved substrate. The model predicted the growth of anisotropic elliptical holes elongated along the whisker axis. We discuss the experimental results in terms of the proposed model, indicating the importance of the change in orientation relationship between the Au grains and KCl whisker along the whisker edges.
盐晶须上AU薄膜的热稳定性
沉积在图案或粗糙衬底上的金属薄膜在微电子、传感、催化和其他纳米技术领域发挥着越来越重要的作用。然而,对于具有复杂三维结构的金属薄膜的热稳定性和固态脱湿问题,目前还知之甚少。在本研究中,我们采用纳米晶金薄膜沉积在棱柱形单晶KCl晶须上的模型系统,在三维环境下研究了薄膜的固态脱湿。在良好的湿度和温度条件下,在多孔衬底上生长KCl晶须阵列。获得了具有高长宽比、[001]轴面和{100}侧面的单晶棱柱形KCl晶须。在晶须表面涂有20 ~ 30nm厚度的保形Au薄膜。在350℃的温度下对这些核壳晶须进行退火,导致Au薄膜的固态脱湿,且沿晶须边缘的脱湿过程比在侧面的脱湿过程要快得多。Au和KCl之间的取向关系是通过在平面KCl(100)衬底上沉积类似制备的Au薄膜来确定的。受实验结果的启发,我们建立了一个数值模型,描述了沉积在弯曲衬底上的薄膜中孔的曲率梯度驱动和表面扩散控制的生长。该模型预测了沿晶须轴伸长的各向异性椭圆孔的生长。我们根据所提出的模型讨论了实验结果,表明了Au晶粒与沿晶须边缘的KCl晶须之间取向关系变化的重要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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