A Disturb Decoupled Column Select 8T SRAM Cell

Vinod Ramadurai, R. Joshi, R. Kanj
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引用次数: 31

Abstract

This paper presents a novel 8 transistor SRAM cell that can be used for enhancing cell Vddmin at and beyond 90 nm technology nodes. This cell provides a way to eliminate the column select read disturb scenario in SRAMs which is one of the impediments to lowering cell voltage. Read disturbs to the selected cell are then minimized by relying on a sense-amp based array architecture which enables discharging the bit-line (BL) capacitance to GND during a read operation thereby enhancing its low voltage operability. The sensitivity of the cell to BL height and sense timing has been studied and the feasibility of the cell has been proved by fabricating a 32 Kb array in a 90 nm PD/SOI technology. Hardware experiments and simulation results show improvements of cell Vddmin over traditional 6T cells by more than 150 mV for 90 nm PD/SOI technology.
干扰去耦柱选择8T SRAM单元
本文提出了一种新型的8晶体管SRAM单元,可用于提高90纳米及以上技术节点的单元Vddmin。该电池提供了一种消除sram中列选择读取干扰的方法,这是降低电池电压的障碍之一。然后,通过依赖基于感测放大器的阵列架构,将对所选单元的读取干扰最小化,该阵列架构能够在读取操作期间将位线(BL)电容放电到GND,从而增强其低电压可操作性。通过在90nm PD/SOI技术中制作32kb阵列,研究了该电池对BL高度和传感时间的灵敏度,并证明了该电池的可行性。硬件实验和仿真结果表明,采用90nm PD/SOI技术,电池的Vddmin比传统的6T电池提高了150 mV以上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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